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Silicon wafer thickness

Description: Thickness of a single wafer, measured at 9 locations for 184 consecutive batches. A single wafer is removed from a tray of wafers (always at the same position for each batch of wafers) after the chemical vapour decomposition process is complete.
Data source: Industrial data (origin unknown). The data have been approximately centered and scaled to disguise the original variables - for confidentiality.

The location of the 9 thicknesses are: Particles in a foam suspension in a stirred tank

Data shape: 184 rows and 9 columns
Usage restrictions: None
Contact person: Kevin Dunn
Contact details: kgdunn@gmail.com
Added here on: 27 March 2011 20:45
Last updated: 11 November 2018 16:35

Preview (first 10 rows)

G1G2G3G4G5G6G7G8G9
0.1750.188-0.1590.0950.374-0.238-0.80.158-0.211
0.1020.0750.1410.180.138-0.057-0.0750.0720.072
0.6070.7110.8790.7650.5920.1870.4310.3450.187
0.7740.8230.6190.370.7250.439-0.025-0.2590.496
0.5040.6440.8450.6810.5020.1510.4040.2960.26
0.570.7290.8790.6240.5880.2040.435-0.0180.354
0.8850.9320.8780.6620.8390.9170.5930.2520.801
-0.0290.0650.2580.078-0.053-0.456-0.153-0.356-0.379
1.3961.4611.3421.1221.3941.4080.9240.6381.375
0.3890.4280.3320.4660.350.539-0.159-0.4590.259

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Tags for this dataset

multivariate outliers
(c) Kevin Dunn, learnche.org